System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

ABSTRACT

A dispenser cathode which comprises an emission surface, a reservoir for material releasing, when heated, work-function-lowering particles, and at least one passage for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, said emission surface comprising at least one emission area and at least one non-emission area covered with emission-suppressing material and surrounding each emission area, said non-emission area comprising at least one passage connecting said reservoir with said non-emission area and debouching within a diffusion length distance from an emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area.

CROSS REFERENCE TO RELATED APPLICATION

The present patent application is a Divisional Application claiming thebenefit of U.S. patent application Ser. No. 12/750,619, filed Mar. 30,2010, which is a Divisional Application claiming the benefit ofContinuation application Ser. No. 11/650,310, filed Jan. 5, 2007 nowU.S. Pat. No. 7,710,009, which claims the benefit of non-provisionalU.S. patent application Ser. No. 10/778,787 filed Feb. 13, 2004 now U.S.Pat. No. 7,215,070 B2, issued May 8, 2007, which claims priority fromU.S. Provisional Application No. 60/447,975, filed Feb. 14, 2003.

BACKGROUND

1. Field of the Invention

The present invention relates to thermionic cathodes, in particular foruse in a lithography system, in particular a multi-beam lithographysystem.

2. Prior Art

Thermionic cathodes, more specific controlled porosity dispenser-typethermionic cathodes, are well known in the art. These dispenser cathodesare commonly used in for instance televisions, computer monitors andmicrowave ovens. Such a dispenser cathode usually comprises a cathodebody with a reservoir comprising a cavity filled with work functionlowering material and with an emission surface, and a heating elementfor generating the heat needed to cause work function lowering particlesto diffuse from the reservoir to an emission area on the emissionsurface and to create the thermionic emission. In general, the entireemission surface is used as emission area.

There are several types of reservoirs known in the art. In a first typeof reservoir, the cavity is filled with a porous matrix and the pores ofthis matrix are filled with the work-function-lowering particles, e.g.compounds of alkaline earth metals like Ba, Ca and Sr. In thesedispenser cathodes, usually one surface of the porous matrix functionsas emission surface. Heating the cathode will release work functionlowering particles from the porous matrix to the emission surface andwill cause thermionic emission.

In a second type of reservoir, work function lowering material ispresent in a space behind the porous matrix. During operation workfunction lowering particles, e.g. Bα or BαO, are generated or releasedwithin the pores and are supplied from the space behind the porousmatrix and then migrate through the pores of the porous matrix and aresupplied to the emission surface in sufficient quantities to maintaingood emission surface coverage which assures adequate emission from theemission surface.

In order to increase brightness of these type of cathodes, a coating isdeposited on top of the porous matrix, usually on the entire surface ofthe metal matrix. Thus, the entire emission surface becomes an emissionarea. The coating usually has several layers, at least one of whichcomprising a work-function-lowering material. Nowadays the most widelyused work-function-lowering material for this coating layer comprises ascandate compound. Appropriate fabrication techniques and components ofthese scandate dispenser cathodes are for instance disclosed in U.S.Pat. Nos. 4,007,393, 4,350,920, 4,594,220, 5,064,397, 5,261,845,5,264,757, 5,314,364, 6,407,633 and 6,348,756, which documents are allincorporated by reference as if fully set forth.

In these known cathodes, the connections between the pores are randomlygenerated. An inherent consequence is that the path length that theactive materials must travel to reach the emission surface can be muchlarger than the thickness of the matrix layer. This limits the lifetimeand emission of these conventional dispenser cathodes. Furthermore,these pores debouche in the emission surface, which forms a relativelylarge emission area in its entirety.

U.S. Pat. No. 4,101,800 discloses a controlled porosity dispensercathode provided with a thin perforated foil on top of the matrix layer.The foil is made of a refractory metal. The active materials migratethrough the holes in the perforated foil to coat the surface of thefoil. The foil thus serves as the emission surface of the cathode. Inthis cathode again, the entire emission surface is emission area

A further improvement of this concept is disclosed in U.S. Pat. No.4,310,603. The dispenser cathode disclosed in this document comprises acathode body comprising a reservoir with work function lowering materialand a heating element located in the cathode body on one side of thereservoir. The opposite side of the reservoir defines an emission sidesurface. The emission side surface of the reservoir is provided with afoil with holes covering the reservoir, welded to the cathode body andpreferably made of tungsten or molybdenum. Parts of the foil areprovided with a coating comprising work function lowering materialdefining emission areas, and parts of the foil are provided withnon-emitting material defining a shadow grid. The work function loweringcoating establishes a lower work function φ and thus an enhancedemissivity of the emission areas. In this cathode, all the holes arelocated in the large emission areas.

In these controlled-porosity dispenser cathodes described above, thedimensions of the pitch between the holes define the path length of theactive materials. However, the holes in the emission surface also inducea severe inhomogenity in the radiation from the cathode. Furthermore,almost the entire emission surface acts as emission area.

The invention further relates to the use of a dispenser-type cathode inelectron beam exposure apparatus like lithography systems, electronmicroscopes, inspection systems. In these electron beam apparatusgenerally a LαB₆-source, a field emitter or a Schotky type emitter isused. Most of these apparatus a relatively low current is required, asthese apparatus require a homogeneous electron source with a relativelysmall dimension. The use of a dispenser cathode with a high brightnessin an electron beam apparatus is therefore not trivial. The diameter ofa prior-art dispenser cathode, for instance, is 100-10,000 times largerthan the diameter of a LαB₆-source or field emitter source. Thus, theemission current is too high for the electron beam apparatus.Furthermore, since more electrons are emitted in the same period oftime. Coulomb interactions reduce the resolution of an apparatus whenusing the known dispenser cathodes.

This problem is especially relevant in single source multi-electron beamsystems. In an attempt to overcome this problem, especially in singlesource multi-electron beam systems, a diverging electron beam with alimited emission area is used. Examples of such systems are disclosed infor example U.S. Pat. Nos. 5,834,783, 5,905,257 and 5,981,954 by Canonand U.S. provisional application 60/422,758 by the present applicant,which is incorporated by reference as if fully set forth. A so-calledtriode setup is most often used to accomplish the diverging electronbeam. The electric field lines produced by two electrodes, oppositelycharged and in close proximity of the emissive cathode surface, createan expanding electron beam using only a fraction of the emittedelectrons. However, before the electrons diverge, their individualtrajectories first converge and go through a crossover. This results instronger Coulomb interactions and consequently in an increase of theenergy spread. This extraction approach thus poses a problem, especiallyin high-resolution systems, like electron beam lithography systems.

SUMMARY OF THE INVENTION

It is an object of the present invention to provide an electron sourceand lithography system improved thereby, which provides a homogeneouselectron beam, homogeneous both in time and in space, in particularrealising an electric field providing a lens effect, more in particularfor resulting into a narrower beam than without such E-field.

It is furthermore an object of the present invention to provide anelectron source with a relatively small emission area.

It furthermore is an object of the present invention to provide anelectron source with a narrow energy distribution.

The present invention to that end provides a dispenser cathode whichcomprises:

an emission surface comprising at least one emission area for emittingelectrons and at least one non-emission area covered withemission-suppressing material and surrounding each emission area;

a reservoir for material releasing, when heated, work-function-loweringparticles, and

at least one passage connecting said reservoir and said emission surfacefor allowing diffusion of work-function-lowering particles from saidreservoir to said emission surface, said at least one passage debauchingin said non-emission area and within a diffusion length distance from anemission area for allowing diffusion of work-function-lowering particlesfrom said reservoir to said emission area.

By applying the emission area having clear boundaries, and passagesdebouching outside the emission area, it has proven possible to obtain adispenser cathode which in both spatially homogeneous as well assuitable for application in high-resolution electron beam systems.

In an embodiment, the emission area comprises a blocking layer forblocking work-function-lowering particles. This blocking layer preventswork function lowering particles not coming through a passage fromreaching the emission area. In this way, the emission area is notdisrupted and remains homogenous. This in turn results in a spatiallyhomogeneous electron beam.

In a further embodiment, the dispenser cathode comprises a membranecovering the emission side of said reservoir, said membrane beingsubstantially impermeable to work-function lowering particles. In thisway a well-defined emission area and a well defined non-emission areacan be created.

In another embodiment, the membrane has an emission side surface and acathode side surface (i.e., the side directed towards the reservoir),said emission side surface having at least one emission area and atleast one non-emission area surrounding said at least one emission area,wherein said emission area is coated with work-function-loweringmaterial and said non-emission area is coated with emission-suppressingmaterial.

In an embodiment of the dispenser cathode with the membrane, themembrane is a metal membrane covering the emission surface side of saidreservoir and is provided with perforations in said non-emission areaproviding passages for said work function lowering particles.

In an embodiment, the passages debouch next to said emission area.Preferably, in this embodiment, the passages debouche adjacent theemission area. This makes it easy for the work function loweringparticles to reach the emission area, and makes the diffusion easilycontrollable.

In an embodiment of the dispenser cathode of the present invention, thedispenser cathode comprises a plurality of passages, all passagesdebouching in said non-emission area.

In another embodiment of the dispenser cathode of the present invention,the emission surface has at least one convex surface. This helpsproducing a diverging beam. In a further embodiment, the emissionsurface is convex at the location of an emission area. When thedispenser cathode is used in high-resolution electron beam systems, itis preferred to use a diverging electron beam, in order to avoidcross-overs in the electron beam, which causes a broadening of theenergy distribution function in the electron beam.

In another embodiment of the dispenser cathode of the present invention,it is furthermore provided with a support structure for supporting saidemission area. In this way, the emission area remains well definedduring operation. In an embodiment, the support structure comprises apillar at the location of the emission area, reaching through saidreservoir. The pillar provides an easy way of providing a well-definedemission area.

In a further embodiment thereof, the pillar has a top, the top formingpart of said emission surface. In a further embodiment, the top of saidpillar forms an emission area.

In still a further embodiment of the dispenser cathode with the pillar,a passage runs along a side of said pillar. In this embodiment, an easyway of making this is by providing a free-standing or substantiallyfree-standing pillar in the reservoir. In this way, the sidewall of thepillar provides a wall of a passage. This way, the pillar has twofunctions: the first function is defining the emission area. Its secondfunction is defining a boundary to a passage for the work functionlowering particles.

Another aspect of the invention concerns a dispenser cathode whichcomprises:

a reservoir for material releasing, when heated, work function loweringparticles;

an emission surface comprising at least one emission area for emittingelectrons, comprising a blocking layer for blocking work functionlowering particles, and

at least one non-emission area covered with emission-suppressingmaterial and surrounding each emission area, and

at least one passage connecting said reservoir and said emission surfacefor allowing diffusion of work-function-lowering particles from saidreservoir to said emission surface.

The blocking layer prevents work function lowering particles fromreaching the emission area via other paths then the ones defined by apassage. In this way, the emission area remains well defined duringoperation.

In an embodiment of this dispenser cathode, the at least one passagedebouches (or discharges, flows out) in said non-emission area andwithin a diffusion length distance from an emission area for allowingdiffusion of work-function-lowering particles from said reservoir tosaid emission area.

In another embodiment, the dispenser cathode of the present inventionfurther comprises an extractor electrode provided above the emissionarea, the extractor electrode provided to provide, in operation, anelectrostatic field functioning as a negative lens to emitted electrons.

In an embodiment of the dispenser cathode described above, it furthercomprises a wall, substantially surrounding the emission surface. Thiswall is added to increase uniformity of the electron beam. In anembodiment, this wall surrounds both the emission surface and saidpassage or passages which are within a diffusion length distance fromsaid emission area. In an embodiment, said wall runs from said emissionarea at about 20-25 degrees, preferably at about the Pierce angle. Anadvantage of this wall, in particular at the specific angles, is animprovement in emission uniformity due to a more uniform E-field. Infact, the emission area merges into the wall as continuously aspossible, in order to create a smooth E-field. In this wall, in anembodiment at a location where the wall goes over in the emission area,one or more passages of channels are provided.

In an embodiment of the dispenser cathode, the emission surface issituated below the level of the surface of the dispenser cathode in arecess in said surface. In an embodiment thereof, the wall of saidrecess is at about 20-25 degrees, preferably at about the Pierce angle,with respect to the emission surface.

In an embodiment of the invention, the dispenser cathode furthercomprises at least one heater for heating said emission area.

In another or in such an embodiment, the dispenser further comprises atleast one heater for heating said work-function-lowering particles.

The invention further relates to a cathode comprising an emission areafor emitting electrons, said emission area merging into a wallsurrounding said emission area, said wall being electrically conductive.In an embodiment, said wall is covered with an emission-suppressing,electrically conducting material. In a further embodiment, the wall isan electric conductor, or is covered with an electric conductor.

In an embodiment of this cathode, said wall substantially runs at anangle of about 20-25 degrees with respect to the emission area.

In a further embodiment thereof, said cathode further comprises at leastone reservoir comprising work-function-lowering particles, and at leastone passage or channel having an inlet for allowingwork-function-lowering particles in said reservoir to enter saidpassage, and an outlet in said wall at a diffusion length distance ofsaid emission area.

The invention further relates to an electron source for generating aplurality of electron beams, comprising a plurality of the dispensercathodes or cathodes as described above.

The invention further relates to a lithography system comprising adispenser cathode of the current invention.

In an embodiment the lithography system further comprises beam splittermeans for splitting the electron beam generated by the dispense cathodeup into a plurality of electron beamlets, modulator means forindividually modulating substantially each electron beamlet, and controlmeans for controlling said modulator means for modulating the beamletsaccording to a predetermined pattern.

BRIEF DESCRIPTION OF THE DRAWINGS

The invention will now be explained with reference to the followingdrawings which are only intended to illustrate preferred embodiments ofthe invention and not to limit its scope of protection.

FIG. 1 shows a cross section of a cathode of the current invention;

FIGS. 2 a, 2 b shows top views of the cathode of FIG. 1, of the emissionsurface indicating different aspects of the current invention;

FIG. 3 shows a cross section of a cathode of the current invention witha support structure supporting the emission area;

FIG. 4 shows a top view of the cathode of FIG. 3;

FIG. 5 shows a cross section of the emission part of a cathode of thecurrent invention with a porous metal reservoir;

FIG. 6 shows a cross section view of another embodiment of a cathode ofthe present invention;

FIG. 7 shows a cross section of a cathode with a convex emissionsurface;

FIG. 8 shows a cross section of another embodiment of a cathode with acurved emission surface;

FIG. 9 shows an embodiment of a cathode of the present invention withsurrounding walls in a Pierce angle P;

FIG. 10 shows another embodiment of a cathode of FIG. 9 with a pillar.

DESCRIPTION OF PREFERRED EMBODIMENTS

In the figures, entities with the same reference numbers relate to thesame or corresponding features.

FIG. 1 shows a first embodiment of a dispenser cathode of the presentinvention. The dispenser cathode has a cathode body 1, the tipper partof which forming a reservoir filled with compounds 2 that dispense, whenheated by a heating element 3, at least one kind ofwork-function-lowering particles towards the emission side surface 4 ofthe reservoir 2. The emission side surface 4 of the reservoir 1 isdivided into two types of areas as shown in FIGS. 2 a and 2 b, showing atop view of the dispenser cathode of FIG. 1.

The first type of area of the emission side surface 4 is the emissionarea 9 which is responsible for the emission of electrons. The emissionarea is usually coated with work function lowering material, likeiridium, osmium or other platinum-group metals, or scandate. Thesematerials or compositions are known to a man skilled in the art.

The second type of area of the emission surface 4 is the non-emissionarea 8 which surrounds each emission area 9. The non-emission area iscoated with emission suppressing material, like zirconium or graphite.

The non-emission areas surrounding each emission area are provided tolimit the area of the emission areas. In this way, it is possible toprovide a cathode having sources having a limited size. In practicalapplications the emission areas will be about 100 micron×100 micron insize or less.

The dispenser cathode is provided with a membrane 6, preferably a metalmembrane, on the emission side surface of the reservoir 1. This membraneensures the homogenity of the electron emission. There is no directconnection between both sides of the membrane 6 in the emission area 9.At the location of the emission area 9, the membrane is substantiallyimpermeable to work-function-lowering particles from the reservoir. Thiscan for instance be accomplished by making the membrane of a metal whichis substantially impermeable to the work function lowering material.Another embodiment provides the membrane with a substantiallyimpermeable layer at the location of the emission area.

The membrane 6 has one or more passages 7, preferably holes, through themembrane 6, connecting reservoir 1 and the emission surface side 4 ofthe membrane 6. The passages 7 allow work-function-lowering particlesfrom the reservoir to diffuse from the reservoir 1 to the emission area9, to enhance the emission of electrons.

On the emission side, the membrane 6 is provided with a layer of workfunction lowering material 9 defining the emission area, and a layer ofemission-suppressing material 8, defining the non-emission area.

A top view of this configuration is depicted in FIG. 2 a. Additionally,choosing the right distance between at least one passage 7 and anyposition residing in the emission area 9 ensures the continuous supplyof work-function-lowering material 2. This distance should be smallerthan the largest diffusion length of the work-function-loweringparticles coming form the reservoir 2. A further enhancement of theemission is established by coating the first area with at least onelayer 9 of work-function-lowering material.

FIG. 2 b shows a top view of membrane 6. The membrane 6 has throughholes at a diffusion length distance from the emission area, and ispreferably a metal membrane. Suitable metals include refractory metalslike tungsten and molybdenum. Work function lowering particles diffusingfrom the reservoir towards the emission surface can only pass themembrane via the holes 7.

Using the heater, the work function lowering particles are released fromthe reservoir. These particles diffuse through the holes in the membraneto the emission area. At the emission area, electrons are released.Using an extraction electrode, the electrons are accelerated.

FIG. 3 shows a second embodiment of the present invention. Again thedispenser cathode comprises a cathode body 1, the upper part of whichforms a reservoir 2, and a heating element 3. The emission surface 4 ofthe dispenser cathode comprises an emission area 9 and a non emissionarea 8 with the same working principle as the dispenser cathode in thefirst embodiment of the present invention, i.e. electrons are emittedfrom the emission area 9, while work-function-lowering particles aresupplied to the emission area 9 via the non-emission area 8 surroundingthe emission area 9. In this particular embodiment, however, instead ofa membrane 6, the non porosity of the emission area for work functionlowering particles is established by a support structure 10 directlyunderneath the emission surface 4. The support structure 10 ispreferably pillar-shaped, and extends through the reservoir. In thisembodiment, the passages debouch adjacent to the emission area.

In this embodiment the reservoir 2 is filled with a porous materialcontaining the work function lowering material in its pores. Thisenhances the dispension of work-function lowering particles towards thesurface. The non-emission area 8 is coated with at least one layer 8 ofemission suppressing material, herewith dramatically reducing theelectron emission from this area. To enhance the electron emission evenfurther, a coating layer 9 of work-function-lowering material isprovided on top of the emission pillar 10. A top view of this embodimentis depicted in FIG. 4.

The pillar 10 is a substantially free standing structure, thus providinga passage around the pillar. In the top view of FIG. 4 it can clearly beseen that the passage 7 surrounds the entire pillar 10 and thus theentire emission area 9.

The support structure 10 preferably comprises a metal. Potentialcandidates are refractory metals like molybdenum and tungsten.

FIG. 5 shows an embodiment of the dispenser cathode of the presentinvention, showing porous material containing the work function loweringmaterial 1. In this embodiment, porous tungsten is used for containingthe work function lowering material. At the emission side of thereservoir, a membrane 6 is provided having holes or perforations 7. Themembrane comprises a non-emission area coated with emission suppressingmaterial 8, and an emission area 9 coated with work function loweringmaterial. In this embodiment, the holes 7 forming the passages for workfunction lowering particles, are provided directly adjacent the emissionarea. Furthermore, the extractor electrode 11 is shown located close tothe emission surface, thus providing a source radiating a diverging beamof electrons. The entire area shown is about 1 mm wide, while theemission area 9 is about 40 μm wide.

FIG. 6 shows another embodiment of the dispenser cathode of the currentinvention. In this embodiment, the emission surface is a curved surfacewhich is convex. The reservoir comprises porous tungsten with workfunction lowering material 1 in its pores. The porous tungsten isprovided with a tungsten membrane 6 which is substantially impermeableto work function lowering particles. The membrane is provided with holes7 providing passages for the work function lowering particles. Again,the emission area 9 is coated with a work function lowering material,e.g. a scandate composition. The remaining area 8 of membrane 6 iscoated with emission suppressing material. Using the convex surface, thedispenser cathode emits an almost perfectly diverging beam of electronshaving one virtual origin.

FIG. 7 shows an embodiment of a dispenser cathode according to thepresent invention having a free-standing tungsten pillar 10 in areservoir filled with porous tungsten provided with work functionlowering material in its pores 1. As the pillar 10 is free-standing,work function lowering particles can pass along the sides 7 of thepillar 10, which thus provides a passage 7 for allowing the particles todiffuse to the emission area 9.

FIG. 8 shows another embodiment of a dispenser cathode according to thepresent invention. In this embodiment, a cone-shaped cathode is providedwith a free-standing tungsten pillar 10. Around this free-standingpillar, the reservoir is provided with porous tungsten 1. Again, thepores contain the work function lowering material which is releasedusing the heater which is not shown. Because of the cone shape,providing a convex surface, and because of the small size of theemission area 9, this source provides a diverging electron beam. Thepillar 10 preferably has a circle cylinder shape. The emission area sidetop 9 is coated with work function lowering material, for instance ascandate composition. The remaining area 8 is coated with emissionsuppressing material.

FIG. 9 shows an embodiment of the cathode of the current Invention,having an emission area 9, coated with work function lowering materialand surrounded by a passage 7 for allowing furtherwork-function-lowering material to reach the emission area 9. In thisspecific embodiment, the cathode has a concave or cone-shaped wall 8surrounding the emission area and which is coated with, or made of,emission suppressing material described above. Preferably, the wall iscoated or made of conducting material. In this way, an electric E-fieldruns as shown in FIG. 9, providing a lens effect which results in anarrower beam.

The angle P of the wall preferably equals the Pierce angle. In mostcases, the angle P will be between 20-25 degrees, more preferably 22-23degrees. In a preferred embodiment, angle P is about 22.5 degrees.

FIG. 10 shows another embodiment of the cathode, where the emissionarea, here on a pillar 9, is below the general surface 12 of thecathode. The emission area is surrounded by a cone shaped wall at abouta Pierce angle P with respect to the emission area 9. Again, an appliedE-field will run as depicted, resulting in a lens effect. Preferably,the wall has an electrically conducting surface and is emissionsuppressing.

The wall 8 in this embodiment merges into the emission area almostcontinuously. The passage or channel for the work-function-loweringparticles preferably interfere as little as possible with the E-field(electric field). In fact, in a contemplated embodiment, the emissionarea smoothly merges into the wall. In this wall, where the emissionarea goes over or emerges into the wall, some small holes are made allthe way to a reservoir with the work-function-lowering particles.

A plurality of the cathodes described above may be combined, resultingin a multi-beam cathode.

It is to be understood that the above description is included toillustrate the operation of the preferred embodiments and is not meantto limit the scope of the invention. The scope of the invention is to belimited only by the following claims. From the above discussion, manyvariations will be apparent to one skilled in the art that would yet beencompassed by the spirit and scope of the present invention.

1. An electron emitting dispenser cathode which comprises: an emissionsurface comprising at least one emission area for emitting electrons; areservoir for material releasing, when heated, work function loweringparticles; a support structure for supporting said emission area, saidsupport structure comprising a pillar; a plurality of passages (7)connecting said reservoir and said emission surface for allowingdiffusion of work function-lowering particles from said reservoir tosaid at least one emission area, said passages being provided directlyadjacent to said at least one emission area, and said pillar defining aboundary to a passage (7) for work function lowering particles adjacentsaid emission area.
 2. The cathode according to claim 1, wherein thecathode comprises a cathode membrane which is provided as a metalmembrane.
 3. The cathode according to claim 2, wherein the metalincludes a refractory metal, wherein the metal preferably is tungsten.4. The cathode according to claim 1, wherein the emission area is coatedwith work function lowering materials.
 5. The cathode according to claim1, wherein said passages debouch next to said emission area.
 6. Thecathode according to claim 1, wherein said emission surface has at leastone convex surface, preferably wherein said emission surface is convexat the location of an emission area.
 7. The cathode according to claim1, wherein the pillar has a top forming part of said emission surface,preferably wherein the top of said pillar forms an emission area.
 8. Thecathode according to claim 1, wherein a passage runs along a side ofsaid pillar.
 9. The cathode according to claim 1, wherein the supportstructure is substantially non-porous for work-function loweringparticles.
 10. An electron source for generating a plurality of electronbeams, comprising a plurality of dispenser cathodes according toclaim
 1. 11. A lithography system comprising a dispenser cathodeaccording to claim
 1. 12. The lithography system of claim 11, furthercomprising beam splitter means for splitting the electron beam generatedby the dispenser cathode up into a plurality of electron beamlets,modulator means for individually modulating substantially each electronbeamlet, and control means for controlling said modulator means and formodulating the beamlets according to a predetermined pattern.
 13. Thelithography system of claim 12, with a single source, multi electronbeam system, comprising only one dispenser cathode.
 14. A semiconductorwafer, processed using a lithography system according to claim
 11. 15. Amethod for processing a semiconductor wafer, using a lithography systemaccording to claim
 11. 16. The cathode according to claim 1, whereinsaid cathode comprises an extractor electrode provided above theemission area, preferably wherein said extractor electrode, inoperation, providing an electrostatic field functioning as a negativelens to emitted electrons.
 17. The cathode according to claim 1 or 16,wherein the cathode is arranged for emitting a diverging electron beam.